[Spm] Re: Spm Digest, Vol 68, Issue 2

Sat Mar 13 13:57:04 EST 2010

Dear Dr. Don:

I can try to answer your question. As you are aware of the definition of
conventional hardness and nanoindentation hardness. Conventional hardness is
mostly measured by estimating the area/impression size of the indenter (for
e.g. Vickers or Knoop indentation).

For a Berkovich indenter, the nanoindentation hardness is measured from the
area function (A(hc)), in which depth is taken into account. In some
materials, if the material shows elastic recovery, the contact area measured
by observation of residual hardness impression may be less than that at the
peak load.

For most of the engineering materials like single crystal metals and
ceramics (refer Oliver and Pharr, 1992), contact area calculated from
hardness impression (using SEM/AFM) match well with that measured with
contact area calculation (nanoindentation).

To answer your question, whether area or depth should be taken into account,
it depends on the type of material being indented.
Please note that if material shows pile up upon indentation, then, contact
area calculated from Oliver-Pharr method is underestimated, which will lead
to overestimation of elastic modulus and hardness, as pile-up is not taken
into account into Oliver-pharr model.

 I hope i attempted to answer your question.

Please let me know if you have any questions. I will be more than happy to
answer.

best wishes,

Rohit

PhD Candidate
Materials and Nanotechnology program
North Dakota State University
Fargo, ND, USA.

> Today's Topics:
>
>   1. Hardness measurement procedure (Don Chernoff at ASM)
>   2. AFM School and 7th PFM Workshop (Catalin Harnagea)
>
>
> ----------------------------------------------------------------------
>
> Message: 1
> Date: Fri, 12 Mar 2010 11:09:52 -0500
> From: "Don Chernoff at ASM" <donc at asmicro.com>
> Subject: [Spm] Hardness measurement procedure
> To: "SPM  List" <spm at spmlist.di.com>
> Message-ID: <9D7A7C68D3224C0EB0B38C253ECA114C at asm15>
> Content-Type: text/plain; charset="iso-8859-1"
>
> When measuring hardness by nanoindentation, one measures the size of the
> indent mark.  Does it matter whether the size is measured as area or depth?
>  Is it better to measure area or depth?
>
> regards,
> Don
> =============================================
> Don Chernoff, Ph.D., President
> Advanced Surface Microscopy, Inc.    E-Mail:  donc at asmicro.com
> 3250 N. Post Rd., Ste. 120           Voice:   317-895-5630
> INDIANAPOLIS IN 46226  USA      Toll free: 800-374-8557 (in USA & Canada)
> web:  http://www.asmicro.com         Fax:     317-895-5652
> [business activities:  analytical services in AFM, AFM probes, consulting,
> training,
> calibration and test specimens, calibration and measurement software,
>  used NanoScope equipment.] 2009-2010 is our 20th year in business!
> =============================================
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> ------------------------------
>
> Message: 2
> Date: Wed, 10 Mar 2010 08:36:40 -0500
> From: "Catalin Harnagea" <harnagea at emt.inrs.ca>
> Subject: [Spm] AFM School and 7th PFM Workshop
> To: "'To:'" <spm at spmlist.di.com>
> Message-ID: <5B7FD10E3501496B9AA2C25472F24E5D at Iasi>
> Content-Type: text/plain;       charset="iso-8859-1"
>
>
> Dear SPM-colleagues,
>
> The program for the Summer School on Advanced AFM Techniques and the 7th
> PFM
> Workshop can be found at the following address:
>
> http://www.physics.mcgill.ca/~juan/afm/
>
> Registration is now open. Please note that the number of places is limited.
>
> Best regards,
> Catalin
>
> °°°°°°°°°°°°°°°°°°°°°°°°°
> Dr. Catalin HARNAGEA
> INRS-Énergie,  Matériaux et Télécommunications
> 1650, boul. Lionel-Boulet
> Varennes (Québec) J3X 1S2 CANADA
> Tel: (450)   929 - 8146 (labs: -8132, -8140)
> Fax: (450)   929 - 8102
> www.emt.inrs.ca
> °°°°°°°°°°°°°°°°°°°°°°°°°°
>
> |-----Original Message-----
> |Sent: Thursday, February 18, 2010 4:26 AM
> |To: spm at spmlist.di.com
> |
> |   1. PFM workshop series (Sergei V. Kalinin)
> |----------------------------------------------------------------------
> |Message: 1
> |Date: Wed, 17 Feb 2010 13:37:12 -0500
> |From: "Sergei V. Kalinin" <sergei2 at ornl.gov>
> |Subject: [Spm] PFM workshop series
> |
> |Dear Colleagues
> |
> |We would like bring to your attention the workshop series on the
> |Piezoresponse Force Microscopy and Nanoscale Electromechanics of Polar
> |Materials. PFM has emerged as a powerful tool to explore and to study
> |nanoscale phenomena in ferroelectric and multiferroic devices, as well
> |as biological and polar macromolecular systems. Recently, PFM was
> |extended to study coupling between polarization and electronic
> |transport, as well as local phenomena in energy storage and generation
> |materials and strongly-correlated oxides, making it directly relevant to
> |the information and energy sciences and technology. The ubiquity of
> |electromechanical couplings in nanoscale systems b  from molecular
> |electromotors to polar solids b  suggests tremendous potential
> |for this technique.
> |
> |This year, the three PFM workshops are planned for 2010 as follows:
> |
> |7^th Workshop will be held in Montreal, Canada, May 31st b  June 4th, as
> |a part of the Summer School on Advanced AFM Techniques and International
> |Workshop on Piezoresponse and Conductive AFM. The contact persons are
> |Andreas Ruediger, (ruediger at emt.inrs.ca) and Alexei Gruverman
> |(agruverman2 at unlnotes.unl.edu).
> |
> |8^th Workshop will be held in Beijing, China, August 25th b  27^th .
> |The information on the workshop can be found at
> |http://www.ustb.edu.cn/materials/files/pfm/International_Worksh
> |op.html.
> |The contact person is Prof. Jiangyu Li (jjli at u.washington.edu and
> |workshoppfm at yahoo.cn <mailto:workshoppfm at yahoo.cn>).
> |
> |9^th Workshop will be held in the conjunction with the International
> |Symposium on Ferroic Domains and Micro- to Nanoscopic structures
> |(ISFD-10) in Prague, Czech Republic, Sept. 22nd-24th. Please visit
> |http://palata.fzu.cz/isfd10/index.php?item=pfm for workshop
> |details. The
> |contact person are /JiE C-/ Hlinka (hlinka at fzu.cz
> |<mailto:hlinka at fzu.cz>)
> |and Andrei Kholkin (kholkin at ua.pt <mailto:kholkin at ua.pt>).
> |
> |All three workshops, conveniently located in America, Europe,
> |and Asia,
> |offer a combination of tutorial lectures by the advanced practitioners
> |of PFM, topical lectures by leading scientists in the field,
> |industrial
> |lectures from PFM manufacturers, and poster sessions for attendees. It
> |also includes extensive lab demos for participants to gain hand-on
> |experience in PFM on various commercial systems, for which the
> |attendees
> |can bring their own samples for testing and examinations. The PFM
> |conference (Prague) will also feature a series of invited and
> |contributed talks by the attendees.
> |
> |On behalf of the PFM workshop series organizers:
> |Sergei V. Kalinin
> |Andrei Kholkin
> |Jiangyu Li
> |
> |--
> |Sergei V. Kalinin
> |co-Theme Leader for Functional Imaging on the Nanoscale
> |The Center for Nanophase Materials Sciences
> |and Materials Sciences and Technology Division
> |Oak Ridge National Laboratory
> |Oak Ridge, TN 37922
> |
> |Section Editor, Nanotechnology
>
>
>
>
> ------------------------------
>
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> End of Spm Digest, Vol 68, Issue 2
> **********************************
>

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