[Spm] CNMS/ShaRE workshop on Aberration-Corrected Microscopy

[Sergei V. Kalinin]

Dear colleagues,
    Just over a day remains for registration for the Workshop on 
Aberration-Corrected Microscopy and Spectroscopy of Materials, to be 
held at the Oak Ridge National Laboratory on Sept 22-23 as a part of 
CNMS/ShaRE users week. With 25 attendees currently registered, the 
workshop has an impressive list of internationally recognized invited 
speakers: M. Watanabe (Lawrence Berkeley National Laboratory), R. Klie 
(U. of Illinois at Chicago), L. Houben (FZ Juelich), P.Voyles (U. of 
Wisconsin - Madison), M. Walls (U. Paris-Sud), O.Lourie (Nanofactory 
Instruments AB). The tutorial program, designed to cover most aspects of 
the use of aberration-corrected microscopy for materials, will be 
presented by Oak Ridge researchers: A. Lupini, M. Oxley, A. Borisevich, 
L. Allard, M. Varela.
    In addition to tutorials and invited talks, demonstrations will be 
held on several of ORNL's advanced microscopes, illustrating 
high-resolution STEM imaging, EELS spectroscopy, and advanced /in situ/ 
holders.
    Registration is available online at https://www.ornl.gov/cnms/share/ 
. Please don't forget to check the tab for this workshop when registering!
    We are looking forward to seeing you at Oak Ridge.
Yours,
Albina Y. Borisevich